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Lithography simulation with LAB enables OPC for Mask Aligner. Iso dense bias adjustement. Size and position of OPC feature serifs, hammerhead. Exposing the pattern multiple times improves line-edge roughness , CD uniformity, resolution and results in a more uniform dose distribution. Shifting the fields andor subfields between the exposures additionally reduces field subfield stitching issues. The 3D PEC feature of BEAMER is the ultimate solution for structuring 3D resist profiles. Exposure d.

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GENISYS-GMBH.COM HISTORY

This site genisys-gmbh.com was first documented on September 05, 2005. This web site was last updated on the date of September 05, 2013. This web page will expire on the date of September 05, 2014. It is now one thousand and six weeks, eleven days, four hours, and nineteen minutes old.
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2005
UPDATED
September
2013
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September
2014

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3
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LINKS TO WEB SITE

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GenISys GmbH

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Eschenstr. 66

Taufkirchen, 82024

DE

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GenISys - Home

DESCRIPTION

Lithography simulation with LAB enables OPC for Mask Aligner. Iso dense bias adjustement. Size and position of OPC feature serifs, hammerhead. Exposing the pattern multiple times improves line-edge roughness , CD uniformity, resolution and results in a more uniform dose distribution. Shifting the fields andor subfields between the exposures additionally reduces field subfield stitching issues. The 3D PEC feature of BEAMER is the ultimate solution for structuring 3D resist profiles. Exposure d.

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This site had the following in the web page, "Lithography simulation with LAB enables OPC for Mask Aligner." We noticed that the web site stated " Iso dense bias adjustement." It also stated " Size and position of OPC feature serifs, hammerhead. Exposing the pattern multiple times improves line-edge roughness , CD uniformity, resolution and results in a more uniform dose distribution. Shifting the fields andor subfields between the exposures additionally reduces field subfield stitching issues. The 3D PEC feature of BEAMER is the ultimate solution for structuring 3D resist profiles."

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